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Feeder 1.0 http://reinventedsoftware.com/feeder/ http://blogs.law.harvard.edu/tech/rss en-us Sat, 29 Sep 2007 08:18:54 -0700 Sat, 29 Sep 2007 08:18:54 -0700 Etching of porous SiOCH http://www.clarycon.com/etchingofporouss.html mail@clarycon.com Sat, 29 Sep 2007 08:18:41 -0700 Etching of metal gates http://www.clarycon.com/metalgateetch(2).html More ...]]> mail@clarycon.com Sun, 24 Dec 2006 07:48:24 -0800 Etching of high k dielectrics http://www.clarycon.com/highketch(2).html More ...]]> mail@clarycon.com Sat, 23 Dec 2006 21:28:49 -0800 ARDE in SAC Etching http://www.clarycon.com/arde_ox_pic.html mail@clarycon.com Sun, 04 Jun 2006 08:39:11 -0700 Contact Etching http://www.clarycon.com/contactetch(2).html mail@clarycon.com Sun, 07 May 2006 10:08:00 -0700 Materials and Gas Systems in Plasma Etching http://www.clarycon.com/materialsandgass.html mail@clarycon.com Mon, 05 Sep 2005 08:52:45 -0700 Non-equilibrium Plasmas http://www.clarycon.com/non-equilibriump.html mail@clarycon.com Mon, 05 Sep 2005 08:51:55 -0700 Reactive and Condensable Species http://www.clarycon.com/species1_pic.html mail@clarycon.com Mon, 05 Sep 2005 08:51:16 -0700 Electron Energy Distribution Function (EEDF) http://www.clarycon.com/electronenergydi.html mail@clarycon.com Mon, 05 Sep 2005 08:50:05 -0700 Electron - Molecule Collisions http://www.clarycon.com/electronmolecule.html mail@clarycon.com Mon, 05 Sep 2005 08:48:49 -0700 Electron Reactions in Plasmas http://www.clarycon.com/electron_reactia.html mail@clarycon.com Mon, 05 Sep 2005 08:48:04 -0700 Surface Processes in Plasma Etching http://www.clarycon.com/surface_proc_sli.html mail@clarycon.com Mon, 05 Sep 2005 08:47:11 -0700 Ions and Radicals in Plasmas http://www.clarycon.com/ions_radicals_pi.html mail@clarycon.com Mon, 05 Sep 2005 08:46:17 -0700 Plasma Etch Mechanisms http://www.clarycon.com/etch_mech_pic.html mail@clarycon.com Mon, 05 Sep 2005 08:45:07 -0700 Spontaneous Reactions in Plasma Etching http://www.clarycon.com/spontaneousetcha.html mail@clarycon.com Mon, 05 Sep 2005 08:43:51 -0700 The Role of Ion Bombardment in Plasma Etching http://www.clarycon.com/roleofionbombara.html mail@clarycon.com Mon, 05 Sep 2005 08:42:35 -0700 Etching Profiles http://www.clarycon.com/etchingprofiles(.html mail@clarycon.com Mon, 05 Sep 2005 08:41:39 -0700 Trenching http://www.clarycon.com/trenching2(plasm.html mail@clarycon.com Mon, 05 Sep 2005 08:40:17 -0700 Sidewall Passivation http://www.clarycon.com/fund_sidewall_pi.html mail@clarycon.com Mon, 05 Sep 2005 08:39:13 -0700 Loading Effects and Aspect Ratio Dependent Etching http://www.clarycon.com/microloading_pic.html mail@clarycon.com Mon, 05 Sep 2005 08:36:33 -0700 Knudsen Transport of Neutral Species http://www.clarycon.com/knudsentransport.html mail@clarycon.com Mon, 05 Sep 2005 08:35:12 -0700 Charging Effects http://www.clarycon.com/charging_slides.html mail@clarycon.com Mon, 05 Sep 2005 08:33:51 -0700 Temperature Effects in Plasma Etching http://www.clarycon.com/temperatureeffea.html mail@clarycon.com Sun, 31 Jul 2005 17:16:24 -0700 Silicon Etching Mechanisms with HBr and Cl2 http://www.clarycon.com/siliconetchmecha.html mail@clarycon.com Sun, 31 Jul 2005 17:15:17 -0700 Plasma and Electrode Potentials http://www.clarycon.com/plasma_potentiaa.html mail@clarycon.com Sat, 16 Jul 2005 08:24:12 -0700 Capacitive and Inductive Coupling http://www.clarycon.com/plasmacoupling2.html mail@clarycon.com Mon, 13 Jun 2005 21:52:48 -0700 MERIE and high density plasmas http://www.clarycon.com/plasmadensities2.html mail@clarycon.com Mon, 13 Jun 2005 21:51:11 -0700 Influence of Mask Marterials in Silicon Gate Etching http://www.clarycon.com/gateetchmasks(2).html mail@clarycon.com Mon, 13 Jun 2005 21:50:00 -0700 Sidewall Passivation During Silicon Gate Etch http://www.clarycon.com/sidewallpassivaa.html mail@clarycon.com Mon, 13 Jun 2005 21:48:54 -0700 The Selfclean Concept in Silicon Gate Etching. http://www.clarycon.com/selfclean_pic.html mail@clarycon.com Mon, 13 Jun 2005 21:44:09 -0700 RIE lag in poly-Si and silicide etching http://www.clarycon.com/rielaginpoly-sia.html mail@clarycon.com Mon, 02 May 2005 20:34:47 -0700 Critical Dimension (CD) Control During Gate Etching http://www.clarycon.com/cd_control_pic.html mail@clarycon.com Mon, 13 Jun 2005 21:42:21 -0700 Dual Gate Etching: The Doping Effect http://www.clarycon.com/dualgateetchinga.html mail@clarycon.com Sat, 23 Apr 2005 23:02:42 -0700 Softlanding During Gate Etching http://www.clarycon.com/softlandingduria.html mail@clarycon.com Sat, 23 Apr 2005 14:02:06 -0700 Gate Oxide Integrity http://www.clarycon.com/gateoxideintegra.html mail@clarycon.com Sat, 26 Mar 2005 15:05:28 -0800 Shallow Trench Etch Top Corner Rounding http://www.clarycon.com/shallowtrenchisc.html mail@clarycon.com Sat, 26 Mar 2005 07:12:42 -0800 Shallow Trench Etch Bottom Corner Rounding http://www.clarycon.com/shallowtrenchisa.html mail@clarycon.com Sat, 26 Mar 2005 07:11:20 -0800 Fundamentals of Shallow Trench Etching http://www.clarycon.com/shallowtrencheta.html mail@clarycon.com Sat, 26 Mar 2005 07:09:55 -0800 Thin Gate Oxide Behavior During Overetch Step http://www.clarycon.com/thingateoxidesda.html mail@clarycon.com Sat, 19 Mar 2005 22:47:53 -0800 Resist Trimming http://www.clarycon.com/resisttrim(2).html mail@clarycon.com Sat, 19 Mar 2005 19:36:28 -0800 Design of a notched gate process http://www.clarycon.com/notchedgates(2).html mail@clarycon.com Sat, 19 Mar 2005 19:34:48 -0800