Clarycon Books

Fundamentals of Plasma Physics

Sun, 18 Nov 2007 10:11:59 -0800

by Paul M. Bellan
This rigorous explanation of plasmas is relevant to diverse plasma applications such as controlled fusion, astrophysical plasmas, solar physics, magnetospheric plasmas, and plasma thrusters. More thorough than previous texts, this book exploits powerful new mathematical techniques to develop deeper insights into plasma behavior. After developing the basic plasma equations from first principles, the book explores single particle motion with particular attention to adiabatic invariance. The author then examines types of plasma waves and the issue of Landau damping. Magnetohydrodynamic equilibrium and stability are tackled with emphasis on the topological concepts of magnetic helicity and self-organization. Advanced topics follow, including magnetic reconnection, nonlinear waves, and the Fokker-Planck treatment of collisions. The book concludes by discussing unconventional plasmas such as non-neutral and dusty plasmas. Written for beginning graduate students and advanced undergraduates, this text emphasizes the fundamental principles that apply across many different contexts.

High Density Plasma Sources: Design, Physics, and Performance

Sun, 18 Nov 2007 10:10:38 -0800

by Oleg A. Popov (Editor)
This book describes the design, physics, and performance of high density (Ne> 10E11 cmE-3) plasma sources which have been extensively explored in low pressure (p -0.1-100 mTorr) plasma processing, such as plasma etching and planarization, plasma enhanced chemical vapor deposition of thin films, sputtered deposition of metals and dielectrics, epitaxial growth of silicon and GaAS, and many other applications.

Plasma Diagnostics, Volume 2: Surface Analysis and Interactions

mail@clarycon.com — Sat, 09 Sep 2006 07:04:20 -0700

by Orlando Auciello (Editor), Daniel L. Flamm (Editor) This is a useful introductory reference book for workers in plasma-based etching and deposition, surface modifications and fusion. The book is a very good compilation of authoritative review chapters on current uses of surface sensitive probes to plasma diagnostics. Plasma science and technology are highly interdisciplinary fields, and this book provides interesting different perspectives on how to approach the study of a surface interacting with a plasma. It should serve as a good starting point for physicists, chemists, or materials scientists who would like to become familiar with this area.

Plasma Processes for Semiconductor Fabrication

mail@clarycon.com — Sat, 09 Sep 2006 07:01:37 -0700

by W. N. G. Hitchon Plasma processing is a central technique in the fabrication of semiconductor devices. This self-contained book provides an up-to-date description of plasma etching and deposition in semiconductor fabrication. It presents the basic physics and chemistry of these processes, and shows how they can be accurately modeled. The author begins with an overview of plasma reactors and discusses the various models for understanding plasma processes. He then covers plasma chemistry, addressing the effects of different chemicals on the features being etched. Having presented the relevant background material, he then describes in detail the modeling of complex plasma systems, with reference to experimental results. The book closes with a useful glossary of technical terms. No prior knowledge of plasma physics is assumed in the book. It contains many homework exercises and serves as an ideal introduction to plasma processing and technology for graduate students of electrical engineering and materials science. It will also be a useful reference for practicing engineers in the semiconductor industry.

Industrial Plasma Engineering

mail@clarycon.com — Sat, 09 Sep 2006 07:00:12 -0700

by J Reece Roth

Etching in Microsystem Technology

mail@clarycon.com — Sat, 21 Jan 2006 12:40:22 -0800

by Michael Köhler

Plasma etching and reactive ion etching

mail@clarycon.com — Sat, 21 Jan 2006 12:37:23 -0800

by J. W Coburn

Plasma Etching : An Introduction

mail@clarycon.com — Sat, 21 Jan 2006 12:35:34 -0800

by Dennis M. Manos, Daniel L. Flamm "The subject matter is therefore well tuned to the needs of workers in the semiconductor industry, although it would also serve as an excellent textbook for a final undergraduate year or postgraduate course on the processing of semiconductor materials. This book is strongly recommended for the libraries of all universities and research laboratories working in the physical sciences." --AUSTRALIAN PHYSICIST [The authors] have produced a comprehensive and very readable book that will be especially valuable to the scientist or engineer just entering the field. The emphasis is clearly on understanding fundamental phenomena rather than specific recipes, thus its utility will outlive the present generation of processes and equipment. --NUCLEAR INSTRUMENTS AND METHODS IN PHYSICS RESEARCH, Section B: Beam Interactions with Materials and Atoms ...They have produced a comprehensive and very readable book that will be especially vauable to the scientist or engineer just entering the field. The emphasis is clearly on understanding fundamental phenomena rather than specific recipes, thus its utility will outlive the present generation of processes and equipment. --Thomas M. Mayer SANDIA NATIONAL LABORATORIES Good discussions of plasma chemistry, plasma diagnostics and handling hazardous gases used in plasmas. --SOCIETY OF VACUUM COATERS

Handbook of Plasma Processing Technology : Fundamentals, Etching, Deposition, and Surface Interactions

mail@clarycon.com — Sat, 21 Jan 2006 12:32:19 -0800

by Stephen M. Rossnagel, Jerome J. Cuomo, William D. Westwood

Wet/Dry Etch Overview

mail@clarycon.com — Sat, 21 Jan 2006 12:29:21 -0800

by Texas Engineering Extension Service

Handbook of Advanced Plasma Processing Techniques

mail@clarycon.com — Sat, 21 Jan 2006 12:27:05 -0800

by R.J. Shul (Editor), S.J. Pearton (Editor)

Principles of Plasma Diagnostics

mail@clarycon.com — Sat, 21 Jan 2006 12:25:02 -0800

by I. H. Hutchinson 'It is a multifaceted work which will not only serve the role of its title but also provide a good teaching and research text in basic plasma and radiation theory. In summary [Principles of Plasma Diagnostics] is a pleasure to read, and an invaluable addition to any astrophysicist's library.' The Observatory 'This book is an important contribution and should be on the shelves of most plasma physicists. It gives diagnostic physicists access to physical descriptions of their own techniques as well as to the physics of complementary observations. It provides graduate students with an effective guide for applying theoretical concepts to their experiments.' Science 'This book provides a very good introduction to plasma diagnostics for someone starting research in the field and would be a worthwhile reference book for anyone interested in plasma physics.' Australian Physicist

ICP Emission Spectrometry : A Practical Guide

mail@clarycon.com — Sat, 19 Mar 2005 19:54:01 -0800

by Joachim Nölte This work introduces novices to ICP emission spectrometry, covering basics as well as information on device technology. After a review of features of ICP-OES, there are chapters on plasma, optics of the spectrometer, method and development, routine analysis, troubleshooting and maintenance, and applications. The layout includes boxed questions and practical solutions, plus checklists and detailed instructions.Copyright © 2004 Book News, Inc., Portland, OR

The Physics and Technology of Ion Sources

mail@clarycon.com — Sun, 06 Mar 2005 17:36:53 -0800

by Ian G. Brown.

Plasma Etching: Fundamentals and Applications (Series on Semiconductor Science and Technology, 7)

mail@clarycon.com — Sun, 06 Mar 2005 16:25:03 -0800

by M. Sugawara, Barry L. Stansfield, Hiroharu Fujita. This book focuses on the remarkable recent advances in understanding low pressure radio frequency glow discharges. It explains the basic analytical theory, plasma physics, and plasma diagnostics, before proceeding to the details of the etching process.

Glow Discharge Processes

mail@clarycon.com — Sun, 06 Mar 2005 16:22:50 -0800

by Brian Chapman. Develops detailed understanding of the deposition and etching of materials by sputtering discharge, and of etching of materials by chemically active discharge. Treats glow discharge at several levels from basic phenomena to industrial applications--practical techniques diligently related to fundamentals. Subjects range from voltage, distributions encountered in plasma etching systems to plasma-electron interactions that contribute to sustaining the discharge. (The publisher, John Wiley & Sons)

Principles of Plasma Discharges and Materials Processing

mail@clarycon.com — Sat, 05 Mar 2005 17:55:47 -0800

by Michael A. Lieberman, Allan J. Lichtenberg. A text-reference that offers an integrated presentation of the fundamental physics and chemistry of partially ionized, chemically reactive, low-pressure plasmas and their roles in a wide range of plasma discharges and processes used in thin film processing applications, especially in the fabrication of integrated circuits. Includes many fully worked examples, practice exercises, and demonstrations of the relationship of plasma parameters to external control parameters and processing results. Annotation copyright Book News, Inc. Portland, Or.